Semiconductor structure and method for forming the same

ABSTRACT

A semiconductor structure and a method for forming the same are disclosed. The method includes the steps of forming a first dielectric layer on a substrate, forming a plurality of first interconnecting structures in the first dielectric layer, forming at least a trench in the first dielectric layer and between the first interconnecting structures, performing a sputtering deposition process to form a second dielectric layer on the first dielectric layer, wherein the second dielectric layer at least partially seals an air gap in the trench, and forming a third dielectric layer on the second dielectric layer.

BACKGROUND OF THE INVENTION 1. Field of the Invention

The present invention is related to a semiconductor structure and amethod for forming the same. More particularly, the present invention isrelated to a semiconductor structure with air gaps formed between theinterconnecting structures and a method for forming the same.

2. Description of the Prior Art

As the progress of the semiconductor manufacturing technology, thedimensions of the electrical devices and interconnecting structures ofan integrated circuit (IC) are shrunk to achieve a higher density.However, the reduction in widths and spaces of the interconnectingstructures may cause increased resistance and parasitic capacitance,which may lead to an obvious RC delay effect to the integrated circuitand impact the speed and performance of the integrated circuit.

Currently, to reduce the influence of the RC delay effect, lowresistance metals (such as copper) are used to form the interconnectingstructures and low-k dielectric materials are used to form theinsulating supporting structure between the interconnecting structures.In advanced semiconductor technology such as ultra-large-scaleintegration (VLSI), the parasitic capacitance may be further reduced tomeet the lower RC delay requirement by introducing air gaps which mayhave a dielectric constant as low as 1 between the interconnectingstructures. However, there are still problems need to be improved. Forexample, the sizes of the air gaps are too small to effectively reducethe parasitic capacitance, and the risk of structural collapses due toinsufficient mechanical supporting of the low-k dielectric materials maybe increased.

SUMMARY OF THE INVENTION

In light of the above, the present invention is directed to provide asemiconductor structure and a method for forming the same, whichparticularly uses a silicon layer to at least partially seal an air gapbetween the interconnecting structures of the semiconductor structure.In this way, the purpose of reducing the parasitic capacitance and RCdelay effect of the interconnecting structures and reducing the risk ofstructure collapse may be achieved at the same time.

According to an embodiment of the present invention, a method forforming a semiconductor structure includes the steps of forming a firstdielectric layer on a substrate, forming a plurality of firstinterconnecting structures in the first dielectric layer, forming atleast a trench in the first dielectric layer between the plurality offirst interconnecting structures, performing a sputtering depositionprocess to form a second dielectric layer on the first dielectric layerand at least partially sealing an air gap in the trench, and forming athird dielectric layer on the second dielectric layer.

According to another embodiment of the present invention, a method forforming a semiconductor structure includes the steps of forming a firstdielectric layer on a substrate, forming a plurality of firstinterconnecting structures in the first dielectric layer, forming atleast a trench in the first dielectric layer between the plurality offirst interconnecting structures, performing a sputtering depositionprocess to form a second dielectric layer on the first dielectric layerand sealing an air gap in the trench, and performing a planarizationprocess to the second dielectric layer.

According to still another embodiment of the present invention, asemiconductor structure includes a first dielectric layer disposed on asubstrate, a plurality of first interconnecting structures disposed inthe first dielectric layer, a silicon oxide layer disposed on the firstdielectric layer and sealing an air gap between the plurality of firstinterconnecting structures, and a low-k dielectric layer disposed on thesilicon oxide layer.

These and other objectives of the present invention will no doubt becomeobvious to those of ordinary skill in the art after reading thefollowing detailed description of the preferred embodiment that isillustrated in the various figures and drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 , FIG. 2 , FIG. 3 , FIG. 4 , FIG. 5 , FIG. 6 , FIG. 7 and FIG. 8are schematic diagrams illustrating a method for forming a semiconductorstructure according to an embodiment of the present invention.

FIG. 4A is a schematic diagram showing a variant of the step shown inFIG. 4 .

FIG. 4B is a schematic diagram showing another variant of the step shownin FIG. 4 .

FIG. 9 is a schematic diagram showing a cross-sectional view of asemiconductor structure according to another embodiment of the presentinvention.

FIG. 10 is a schematic diagram showing a cross-sectional view of asemiconductor structure according to still another embodiment of thepresent invention.

DETAILED DESCRIPTION

In the following disclosure, details will be described with reference tothe drawings. The contents of the drawings also form part of thedetailed description of the specification, and are illustrated by way ofspecific examples in which the embodiment can be implemented. Thefollowing examples have described sufficient details to enable those ofordinary skill in the art to practice. Of course, other embodiments maybe adopted, or any structural, logical, and electrical changes may bemade without departing from the embodiments described herein. Therefore,the following detailed description should not be taken as limiting, butrather, the embodiments contained herein will be defined by the appendedclaims.

The term “low-k dielectric material” as used in the present inventionrefers to a dielectric material having a dielectric constant less thanthe dielectric constant of the silicon oxide (about 3.9). For example,the low-k dielectric materials used in the present invention may have adielectric constant between 2.5 and 3.5. The low-k dielectric materialsused in the present invention may include fluorinated silicate glass(FSG), fluorinated carbon-doped silicon oxide (SiCOF), hydrogenatedsilicon oxycarbide (SiCOH), hydrogenated silicon carbonitride (SiCN:H),hydrogenated oxidized silicon carbon, SiLK®, polyimide, organosilicateglass (OSG), parylene, methyl siloxane-silica, polymethylmethacrylate(PMMA), FLARE®, organosilicate glass (OSG), hydrogen silsesquioxane(HSQ), methylsilsesquioxane (MSQ), or a combination thereof, but are notlimited thereto.

The term “air gap” as used in the present invention refers to a voidsealed in the semiconductor structure by a layer or multiple layers ofdielectric layers. The air gap may be a vacuum void, or may be at leastpartially filled with air or inert gases. In the embodiments illustratedin the following description, the air gap of the semiconductor structureis formed in a trench between the neighboring interconnectingstructures. It should be understood by the skilled person in the artthat the air gap may be formed in other portions of the semiconductorstructure as required.

FIG. 1 , FIG. 2 , FIG. 3 , FIG. 4 , FIG. 5 , FIG. 6 , FIG. 7 and FIG. 8are schematic diagrams illustrating the successive steps of a method forforming a semiconductor structure according to an embodiment of thepresent invention. Please refer to FIG. 1 , a substrate 10 is provided.The substrate 10 may be a silicon substrate, an epitaxial siliconsubstrate, a silicon germanium (SiGe) substrate, a silicon carbide (SiC)substrate, or a silicon-on-insulator (SOI) substrate, but is not limitedthereto. An etching stop layer 16, an interlayer dielectric layer 18,and a first dielectric layer 20 are successively formed on the substrate10.

The substrate 10 may include a plurality of isolation structures 12 andan active region 14 defined in the substrate 10 by the isolationstructures 12. At least a semiconductor device 100 may be formed in theactive region 14. According to an embodiment of the present invention,the semiconductor device 100 may include a metal oxide semiconductorfield effect transistor (MOSFET) and includes a gate structure 102formed on a portion of the active region 14, the source/drain regions104 formed in the active region 14 at two sides of the gate structure102, and the gate dielectric layer 103 formed between the gate structure102 and the active region 14. It should be understood that the substrate10 may include other active or passive electrical devices such as, butnot limited to, diodes, thyristors, memories, light emitting devices,resistors, capacitors, and inductors, which are not shown in thedrawings for the sake of simplicity.

The etching stop layer 16 is formed on the substrate 10 and covers thegate structure 102. The interlayer dielectric layer 18 is formed on theetching stop layer 16 in a blanket manner and is planarized to form aflat top surface for the convenience of forming subsequentinterconnecting structures. A plurality of contact plugs 19 are formedin the interlayer dielectric layer 18 and penetrates through the etchingstop layer 16 to contact and electrically connect to the semiconductordevice 100. Although only the contact plugs 19 disposed on thesource/drain regions 104 are shown in FIG. 1 , it should be understoodthat a contact plug (not shown) may also be provided on a portion of thegate structure 102 to contact and electrically connect to the gatestructure 102. In the process for forming the contact plugs 19, theetching stop layer 16 may be used as an etching stop layer to controlthe etching depth of the contact holes for forming the contact plugs 19.In some embodiments, the etching stop layer 16 may include a stress inaccordance with the conductivity type of the semiconductor device 100 inorder to improve the performance of the semiconductor device 100. Forexample, when the semiconductor device 100 is a p-type MOSFET, theetching stop layer 16 may include a compressive stress. On the otherhand, when the semiconductor device 100 is an n-type MOSFET, the etchingstop layer 16 may include a tensile stress. The etching stop layer 16may be single layered or multiple layered, and may be made of adielectric material such as carbon doped oxide (CDO), silicon oxycarbide(SiOC), silicon nitride (SiN), silicon oxynitride (SiON), silicon carbonnitride (SiCN), nitride doped silicon carbide (NDC), or a combinationthereof, but are not limited thereto. According to an embodiment of thepresent invention, the etching stop layer 16 may include SiN. Theinterlayer dielectric layer 18 may be single layered or multiplelayered, and may include a dielectric material such as silicon oxide(SiO2), un-doped silicon glass (USG), fluorinated silicate glass (FSG),a low-k dielectric material, or a combination thereof, but are notlimited thereto. According to an embodiment of the present invention,the interlayer dielectric layer 18 may include silicon oxide. Thecontact plugs 19 may include a metal material such as cobalt (Co),copper (Cu), aluminum (Al), tungsten (W), nickel (Ni), platinum (Pt),tantalum (Ta), titanium (Ti), a compound of the above metals, acomposite layer or an alloy of the above metals, but are not limitedthereto. According to an embodiment of the present invention, thecontact plugs 19 may include tungsten (W).

The first dielectric layer 20 may be mostly made of a dielectricmaterial layer 24. Optionally, the first dielectric layer 20 may includean etching stop layer 22 under the dielectric material layer 24 andbetween the dielectric material layer 24 and the interlayer dielectriclayer 18. The dielectric material layer 24 may include a dielectricmaterial, such as a low-k dielectric material. The etching stop layer 22is made of a dielectric material such as SiN, SiON, SiCN, or NDC, but isnot limited thereto. The material of the etching stop layer 22 isdifferent from the dielectric material layer 24 to provide an etchingselectivity over the dielectric material layer 24. According to anembodiment of the present invention, the etching stop layer 22 mayinclude SiCN.

A plurality of first interconnecting structures 26 may be formed in thefirst dielectric layer 20 through semiconductor manufacturing processessuch as photolithography process, etching process, deposition process,and planarization process. The bottom portions of the firstinterconnecting structures 26 may penetrate through the etching stoplayer 22 to contact and electrically connect to the contact plugs 19.The first interconnecting structures 26 may include a metal materialsuch as cobalt (Co), copper (Cu), aluminum (Al), tungsten (W), nickel(Ni), platinum (Pt), tantalum (Ta), titanium (Ti), a compound of theabove metals, a composite layer or an alloy of the above metals, but arenot limited thereto. According to an embodiment of the presentinvention, the first interconnecting structures 26 may include copper(Cu). As shown in FIG. 1 , the bottom portions of the firstinterconnecting structures 26 may extend to be lower than the lowersurface of the etching stop layer 22 and into an upper portion of theinterlayer dielectric layer 18. It should be understood that the firstdielectric layer 20 may include other interconnecting structures (notshown) that are used for lateral routing and the bottom portions of theinterconnecting structures (not shown) are not in contact with anycontact plugs.

Please refer to FIG. 2 . Subsequently, an etching stop layer 32, a hardmask layer 33, and a photoresist layer 34 are formed on the firstdielectric layer 20 (on the dielectric material layer 24). The materialssuitable to form the etching stop layer 32 may be referred to thematerial of the etching stop layer 16 and will not be repeated hereinfor the sake of simplicity. According to an embodiment of the presentinvention, the etching stop layer 32 may include SiN. The material ofthe hard mask layer 33 is different from the material of the etchingstop layer 32 to be able to be selectivity removed from the etching stoplayer 32 in later process. According to an embodiment of the presentinvention, the hard mask layer 33 may include titanium nitride (TiN).The photoresist layer 34 is patterned to form at least a first opening34 a to expose a portion of the hard mask layer 33.

Please refer to FIG. 3 . Subsequently, a first etching process E1 isperformed to etch the hard mask layer 33 through the first opening 34 ato form a second opening 33 a in the hard mask layer 33 to expose aportion of the etching stop layer 32.

Please refer to FIG. 4 . Following, a second etching process E2 isperformed to etch the etching stop layer 32 and the first dielectriclayer 20 through the first opening 34 a and the second opening 33 a toform at least a trench 36 in the first dielectric layer 20 and betweenthe first interconnecting structures 26. In some embodiments, as shownin FIG. 4 , the second etching process E2 may etch through the wholethickness of the first dielectric layer 20 (through the etching stoplayer 22) and continue to etch an upper portion of the interlayerdielectric layer 18, so that the bottom portion of the trench 36 mayextend into the upper portion of the interlayer dielectric layer 18, andthe bottom portion of the trench 36 may be at a horizontal levelsubstantially flush with or a little higher than the bottom portions ofthe first interconnecting structures 26. In some embodiments, as shownin FIG. 4A, the second etching process E2 may etch through thedielectric material layer 24 but not through the etching stop layer 22of the first dielectric layer 20, so that the bottom portion of thetrench 36 is terminated in the etching stop layer 22. In someembodiments, as shown in FIG. 4B, the second etching process E2 does notetch through the dielectric material layer 24 of the first dielectriclayer 20, so that the bottom portion of the trench 36 is terminated inthe dielectric material layer 24 of the first dielectric layer 20.According to an embodiment of the present invention, after the secondetching process E2, the sidewalls of the first interconnectingstructures 26 are completely covered by the dielectric material layer 24of the first dielectric layer 20. The trench 36 does not expose anyportion of the first interconnecting structures 26.

Please refer to FIG. 5 . After forming the trench 36, the remainingportions of the photoresist layer 34 and hard mask layers 33 (shown inFIG. 4 ) are completely removed from the etching stop layer 32 to exposea surface of the etching stop layer 32.

Please refer to FIG. 6 . Subsequently, a sputtering deposition processP1 is performed to form a second dielectric layer 38 on the firstdielectric layer 20. A portion of the second dielectric layer 38 mayfill into the trench 36 to cover the sidewalls and bottom surface of thetrench 36. The sputtering deposition process P1 may include ion-beamsputtering process, ion-assisted deposition process, reactivesputtering, high-power impulse magnetron sputtering (HIPIMS), or glowsputtering, but are not limited thereto. According to an embodiment ofthe present invention, the sputtering deposition process P1 may includethe steps of transferring the substrate 10 to a reaction chamber, usingRF accelerated ions such as argon (Ar) ions to bombard a surface of atarget material to make the atoms or molecules of the target material bestruck out from the surface of the target material and deposited on thesurface of substrate 10. According to an embodiment of the presentinvention, the second dielectric layer 38 is a silicon oxide layer. Thetarget material for forming the second dielectric layer 38 may be asilicon oxide target or other suitable target materials. In some cases,during the sputtering deposition process P1, oxygen gas may beintroduced into the reaction chamber to react with the atoms ormolecules struck out from the target material to form the material ofthe second dielectric layer 38. One feature of the present invention isthat, by forming the second dielectric layer 38 through the sputteringdeposition process P1, the deposition rate of the second dielectriclayer 38 in the vertical direction may be significantly lower than inthe horizontal direction, and is less likely to fill into the trench 36.Accordingly, obvious overhang portions 38 a of the second dielectriclayer 38 may be formed at the opening of the trench 36 to at leastpartially seal an air gap 40 in the trench 36 while the seconddielectric layer 38 deposited on the sidewalls and/or bottom surface ofthe trench 36 is still thin in thickness. According to an embodiment ofthe present invention, the sputtering deposition process P1 may becontinued until the distance D1 between the overhang portions 38 a attwo sides of the opening of the trench 36 is approximately equal to orsmaller than ¼ of the width W1 of the opening.

Please refer to FIG. 7 . Subsequently, a deposition process P2 may beperformed to form a third dielectric layer 42 on the second dielectriclayer 38. The air gap 40 is completely sealed by the third dielectriclayer 42. A planarization process P3 may be performed to the thirddielectric layer 42 until a planar surface 42 a of the third dielectriclayer 42 is obtained. The deposition process P2 may include chemicalvapor deposition (CVD) process, plasma-enhanced chemical vapordeposition (PECVD) process, spin-on process, but is not limited thereto.According to an embodiment of the present invention, the depositionprocess P2 is a chemical vapor deposition (CVD) process. According to anembodiment of the present invention, the third dielectric layer 42 mayinclude a low-k dielectric material.

Please refer to FIG. 8 . Following, a plurality of secondinterconnecting structures 44 may be formed in the second dielectriclayer 38 and the third dielectric layer 42 through semiconductormanufacturing processes such as photolithography process, etchingprocess, deposition process, and planarization process. As shown in FIG.8 , the second interconnecting structures 44 may respectively include avia portion 44 a and a routing portion 44 b on the via portion 44 a. Thebottom portions of the via portions 44 a penetrate through the seconddielectric layer 38 and the etching stop layer 32 to contact andelectrically connect to the first interconnecting structures 26. The topportions of the routing portions 44 b are exposed from the thirddielectric layer 42 and are flush with the surface 42 a of the thirddielectric layer 42. Some of the top portions of the routing portions 44b may be electrically connected to the upper interconnecting structure(not shown) that are formed in later processes. The material of thesecond interconnecting structures 44′ may include a metal such as cobalt(Co), copper (Cu), aluminum (Al), tungsten (W), nickel (Ni), platinum(Pt), tantalum (Ta), titanium (Ti), a compound of the above metals, acomposite layer or an alloy of the above metals, but are not limitedthereto. According to an embodiment of the present invention, the secondinterconnecting structures 44 may include copper (Cu). It should beunderstood that the second dielectric layer 38 and the third dielectriclayer 42 may include other interconnecting structures (not shown) thatare used for lateral routing and the bottom portions of interconnectingstructures (not shown) are not in contact with any first interconnectingstructures 26.

Please continue to refer to FIG. 8 , which shows a semiconductorstructure according to an embodiment of the present invention. Thesemiconductor structure includes a substrate 10 and a first dielectriclayer 20 disposed on the substrate 10. An etching stop layer 16 and aninterlayer dielectric layer 18 may be disposed between the substrate 10and the first dielectric layer 20. A plurality of first interconnectingstructures 26 are disposed in the first dielectric layer 20. At least atrench 36 is formed in the first dielectric layer 20 between the firstinterconnecting structures 26. A second dielectric layer 38 (forexample, a silicon oxide layer) is disposed on the first dielectriclayer 20 and extends into the trench 36 to partially seal an air gap 40in the trench 36. A third dielectric layer 42 (for example, a low-kdielectric layer) is disposed on the second dielectric layer 38 andcompletely seals the air gap 40. That is, the second dielectric layer 38and the third dielectric layer 42 together seal the air gap 40. Incomparison with conventional technology mostly using low-k dielectricmaterials to seal the air gap and form the insulating supportingstructure between the interconnecting structures, in the semiconductorstructure shown in FIG. 8 , the second dielectric layer 38 made ofsilicon oxide (providing better structural supporting to thesemiconductor structure) and the third dielectric layer 42 made of low-kdielectric material (providing less structural supporting to thesemiconductor structure) are used concurrently to seal the air gap 40and to form the insulating supporting structure between theinterconnecting structures. In this way, the parasitic capacitancebetween the interconnecting structures and the resulting RC delay effectmay be reduced while the risk of structure collapse may also be reduced.Additionally, the present invention using the sputtering depositionprocess P1 to form the second dielectric layer 38 may easily formobvious overhang portions 38 a at two sides of the opening of the trench36 while the second dielectric layer 38 filling into the trench 36 isstill thin in thickness. In this way, a larger air gap 40 may be formedin the trench 36 and the parasitic capacitance may be further reduced.In some embodiments, as shown in FIG. 8 , the sidewalls and bottomsurface of the trench 36 may be completely covered by the seconddielectric layer 38, so that the air gap 40 would not be in directcontact with the first dielectric layer 20. It some embodiments, thesidewalls and bottom surface of the trench 36 may be partially coveredby the second dielectric layer 38, so that the air gap 40 may be indirect contact with the first dielectric layer 20, the etching stoplayer 22, and/or the interlayer dielectric layer 18.

The following description will detail the different embodiments of thepresent invention. To simplify the description, identical components ineach of the following embodiments are marked with identical symbols. Formaking it easier to understand the differences between the embodiments,the following description will detail the dissimilarities amongdifferent embodiments and the identical features will not be redundantlydescribed.

FIG. 9 is a schematic diagram showing a cross-sectional view of asemiconductor structure according to another embodiment of the presentinvention, which is different from the semiconductor structure shown inFIG. 8 in that, the deposition (the sputtering deposition process P1shown in FIG. 6 ) of the second dielectric layer 38 may be continueduntil the overhang portions 38 a (shown in FIG. 6 ) of the seconddielectric layer 38 at two sides of the opening of the trench are mergedto completely seal the air gap 40. Therefore, the air gap 40 and thethird dielectric layer 42 are not in direct contact with each other.

FIG. 10 is a schematic diagram showing a cross-sectional view of asemiconductor structure according to still another embodiment of thepresent invention, which is different from the semiconductor structureshown in FIG. 8 in that, the deposition (the sputtering depositionprocess P1 shown in FIG. 6 ) of the second dielectric layer 38 may becontinued until the air gap 40 is completely sealed and the thickness ofthe second dielectric layer 38 on the first dielectric layer 20 issufficient for forming the second interconnecting structures 44. Aplanarization process may be performed to the second dielectric layer 38until a planar surface 38 b of the second dielectric layer 38 isobtained, and then the second interconnecting structures 44 are formedin the second dielectric layer 38. The top portions of the secondinterconnecting structures 44 are flush with the surface 38 b of thesecond dielectric layer 38. The semiconductor structure shown in FIG. 10uses the second dielectric layer 38 made from sputtering silicon oxideto seal the air gap 40 and to serve as the insulating supportingstructure between the second interconnection structure 44, so that anenlarged air gap 40 may be obtained while a better structural supportmay also be achieved.

Those skilled in the art will readily observe that numerousmodifications and alterations of the device and method may be made whileretaining the teachings of the invention. Accordingly, the abovedisclosure should be construed as limited only by the metes and boundsof the appended claims.

What is claimed is:
 1. A method for forming a semiconductor structure,comprising: forming a first dielectric layer on a substrate; forming aplurality of first interconnecting structures in the first dielectriclayer; forming at least a trench in the first dielectric layer betweenthe plurality of first interconnecting structures, wherein none of theplurality of first interconnecting structures is exposed from thetrench; performing a sputtering deposition process to form a seconddielectric layer on the first dielectric layer and at least partiallysealing an air gap in the trench; and forming a third dielectric layeron the second dielectric layer.
 2. The method for forming asemiconductor structure according to claim 1, wherein the seconddielectric layer comprises silicon oxide.
 3. The method for forming asemiconductor structure according to claim 1, wherein the thirddielectric layer comprises a low-k dielectric material.
 4. The methodfor forming a semiconductor structure according to claim 1, wherein thefirst dielectric layer comprises a low-k dielectric material.
 5. Themethod for forming a semiconductor structure according to claim 1,wherein the air gap is completely sealed by the second dielectric layer.6. The method for forming a semiconductor structure according to claim1, wherein the air gap is partially sealed by the second dielectriclayer and completely sealed by the third dielectric layer.
 7. The methodfor forming a semiconductor structure according to claim 1, furthercomprising: performing a planarization process to the third dielectriclayer; and forming a plurality of second interconnecting structuresthrough the third dielectric layer and the second dielectric layer toelectrically connect to the first interconnecting structures.
 8. Themethod for forming a semiconductor structure according to claim 1,wherein the step of forming the trench comprises: forming a hard masklayer on the first dielectric layer; forming a photoresist layer on thehard mask layer and a first opening in the photoresist layer to expose aportion of the hard mask layer; through the first opening, etching thehard mask layer to form a second opening in the hard mask layer; throughthe first opening and the second opening, etching the first dielectriclayer to form the trench; and removing the photoresist layer and thehard mask layer completely.
 9. The method for forming a semiconductorstructure according to claim 8, wherein the hard mask layer comprisestitanium nitride (TiN).
 10. A method for forming a semiconductorstructure, comprising: forming a first dielectric layer on a substrate;forming a plurality of first interconnecting structures in the firstdielectric layer; forming at least a trench in the first dielectriclayer between the plurality of first interconnecting structures, whereinnone of the plurality of first interconnecting structures is exposedfrom the trench; performing a sputtering deposition process to form asecond dielectric layer on the first dielectric layer and sealing an airgap in the trench; and performing a planarization process to the seconddielectric layer.
 11. The method for forming a semiconductor structureaccording to claim 10, wherein the second dielectric layer comprisessilicon oxide.
 12. The method for forming a semiconductor structureaccording to claim 10, further comprising forming a plurality of secondinterconnecting structures through the second dielectric layer toelectrically connect to the first interconnecting structures.
 13. Themethod for forming a semiconductor structure according to claim 10,wherein the step of forming the trench comprises: forming a hard masklayer on the first dielectric layer; forming a photoresist layer on thehard mask layer and a first opening in the photoresist layer to expose aportion of the hard mask layer; through the first opening, etching thehard mask layer to form a second opening in the hard mask layer; throughthe first opening and the second opening, etching the first dielectriclayer to form the trench; and removing the photoresist layer and thehard mask layer completely.
 14. The method for forming a semiconductorstructure according to claim 13, wherein the hard mask layer comprisestitanium nitride (TiN).
 15. A semiconductor structure, comprising: afirst dielectric layer disposed on a substrate; a plurality of firstinterconnecting structures disposed in the first dielectric layer; asilicon oxide layer disposed on the first dielectric layer and sealingan air gap between the plurality of first interconnecting structures,wherein the silicon oxide layer is completely separated from theplurality of first interconnecting structures by the first dielectriclayer; and a low-k dielectric layer disposed on the silicon oxide layer.16. The semiconductor structure according to claim 15, wherein the airgap is completely sealed by the silicon oxide layer.
 17. Thesemiconductor structure according to claim 15, wherein the air gap iscompletely sealed by the silicon oxide layer and the low-k dielectriclayer.